Ion Implantation for Deterministic Single Atom Devices

التفاصيل البيبلوغرافية
العنوان: Ion Implantation for Deterministic Single Atom Devices
المؤلفون: Pacheco, J. L., Singh, M., Perry, D. L., Wendt, J. R., Eyck, G. Ten, Manginell, R. P., Pluym, T., Luhman, D. R., Lilly, M. P., Carroll, M. S., Bielejec, E.
سنة النشر: 2017
المجموعة: Condensed Matter
Physics (Other)
مصطلحات موضوعية: Condensed Matter - Mesoscale and Nanoscale Physics, Physics - Applied Physics
الوصف: We demonstrate a capability of deterministic doping at the single atom level using a combination of direct write focused ion beam and solid-state ion detectors. The focused ion beam system can position a single ion to within 35 nm of a targeted location and the detection system is sensitive to single low energy heavy ions. This platform can be used to deterministically fabricate single atom devices in materials where the nanostructure and ion detectors can be integrated, including donor-based qubits in Si and color centers in diamond.
نوع الوثيقة: Working Paper
DOI: 10.1063/1.5001520
URL الوصول: http://arxiv.org/abs/1711.00792
رقم الأكسشن: edsarx.1711.00792
قاعدة البيانات: arXiv