We present a comparative study on the influence of applied magnetic field on the resistance of $C_{1-x}Co_x$ thin films (with $x=0.1$, $0.15$ and $0.2$) grown on $Si$ substrate by pulsed laser deposition technique. It is found that the behavior of magnetoresistance (MR) drastically depends on the temperature. Namely, at low temperatures MR is positive and its behavior is governed by the field mediated weak localization scenario. While at high temperatures MR turns negative and its behavior is dominated by electron scattering on ferromagnetic cobalt atoms.
