تقرير
Thermally activated diffusion and lattice relaxation in (Si)GeSn materials
| العنوان: | Thermally activated diffusion and lattice relaxation in (Si)GeSn materials |
|---|---|
| المؤلفون: | Driesch, Nils von den, Wirths, Stephan, Troitsch, Rene, Mussler, Gregor, Breuer, Uwe, Moutanabbir, Oussama, Grützmacher, Detlev, Buca, Dan |
| المصدر: | Phys. Rev. Materials 4, 033604 (2020) |
| سنة النشر: | 2019 |
| المجموعة: | Condensed Matter |
| مصطلحات موضوعية: | Condensed Matter - Materials Science |
| الوصف: | Germanium-Tin (GeSn) alloys have emerged as a promising material for future optoelectronics, energy harvesting and nanoelectronics owing to their direct bandgap and compatibility with existing Si-based electronics. Yet, their metastability poses significant challenges calling for in-depth investigations of their thermal behavior. With this perspective, this work addresses the interdiffusion processes throughout thermal annealing of pseudomorphic GeSn binary and SiGeSn ternary alloys. In both systems, the initially pseudomorphic layers are relaxed upon annealing exclusively via thermally induced diffusional mass transfer of Sn. Systematic post-growth annealing experiments reveal enhanced Sn and Si diffusion regimes that manifest at temperatures below 600{\deg}C. The amplified low-temperature diffusion and the observation of only subtle differences between binary and ternary hint at the unique metastability of the Si-Ge-Sn material system as the most important driving force for phase separation. Comment: 15 pages, 3 figures |
| نوع الوثيقة: | Working Paper |
| DOI: | 10.1103/PhysRevMaterials.4.033604 |
| URL الوصول: | http://arxiv.org/abs/1911.02334 |
| رقم الأكسشن: | edsarx.1911.02334 |
| قاعدة البيانات: | arXiv |
| DOI: | 10.1103/PhysRevMaterials.4.033604 |
|---|