Guidelines for the stabilization of a polar rhombohedral phase in epitaxial Hf0.5Zr0.5O2 thin films

التفاصيل البيبلوغرافية
العنوان: Guidelines for the stabilization of a polar rhombohedral phase in epitaxial Hf0.5Zr0.5O2 thin films
المؤلفون: Nukala, Pavan, Wei, Yingfen, de Haas, Vincent, Guo, Qikai, Antoja-Lleonart, Jordi, Noheda, Beatriz
المصدر: Ferroelectrics, 569:1, 148-163 (2020)
سنة النشر: 2020
المجموعة: Condensed Matter
مصطلحات موضوعية: Condensed Matter - Materials Science
الوصف: The unconventional Si-compatible ferroelectricity in hafnia-based systems, which becomes robust only at nanoscopic sizes, has attracted a lot of interest. While a metastable polar orthorhombic (o-) phase (Pca21) is widely regarded as the responsible phase for ferroelectricity, a higher energy polar rhombohedral (r-) phase is recently reported on epitaxial HfZrO4 (HZO) films grown on (001) SrTiO3 (R3m or R3), (0001) GaN (R3), and Si (111). Armed with results on these systems, here we report a systematic study leading towards identifying comprehensive global trends for stabilizing r-phase polymorphs in epitaxially grown HZO thin films (6 nm) on various substrates (perovskites, hexagonal and Si).
Comment: Final version as it appears in the 50th Anniversary issue of Ferroelectrics
نوع الوثيقة: Working Paper
DOI: 10.1080/00150193.2020.1791658
URL الوصول: http://arxiv.org/abs/2005.01809
رقم الأكسشن: edsarx.2005.01809
قاعدة البيانات: arXiv
الوصف
DOI:10.1080/00150193.2020.1791658