The dependencies of the B$_{i}$O$_{i}$ defect concentration on doping, irradiation fluence and particle type in p-type silicon diodes have been investigated. We evidenced that large data scattering occurs for fluences above $10^{12}$ 1 MeV neutrons/cm$^2$, becoming significant larger for higher fluences. We show that the B$_{i}$O$_{i}$ defect is metastable, with two configurations A and B, of which only A is detected by Deep Level Transient Spectroscopy and Thermally Stimulated Currents techniques. The defect's electrical activity is influenced by the inherent variations in ambient and procedural experimental conditions, resulting not only in a large scattering of the results coming from the same type of measurement but making any correlation between different types of experiments difficult. It is evidenced that the variations in [B$_{i}$O$_{i}^\mathrm{A}$] are triggered by subjecting the samples to an excess of carriers, by either heating or an inherent short exposure to ambient light when manipulating the samples prior to experiments. It causes $\approx$7h variations in both, the [B$_{i}$O$_{i}^\mathrm{A}$] and in the effective space charge. The analyses of structural damage in a diode irradiated with 10$^{19}$ 1 MeV neutrons/cm$^2$ revealed that the Si structure remains crystalline and vacancies and interstitials organize in parallel tracks normal to the Si-SiO$_{2}$ interface.
