Employing High-temperature-grown SrZrO$_3$ Buffer to Enhance the Electron Mobility in La:BaSnO$_3$-based Heterostructures

التفاصيل البيبلوغرافية
العنوان: Employing High-temperature-grown SrZrO$_3$ Buffer to Enhance the Electron Mobility in La:BaSnO$_3$-based Heterostructures
المؤلفون: Ngabonziza, Prosper, Park, Jisung, Sigle, Wilfried, van Aken, Peter A., Mannhart, Jochen, Schlom, Darrell G.
المصدر: Applied Physics Letters 122, 241902 (2023)
سنة النشر: 2023
المجموعة: Condensed Matter
مصطلحات موضوعية: Condensed Matter - Materials Science
الوصف: We report a synthetic route to achieve high electron mobility at room temperature in epitaxial La:BaSnO$_3$/SrZrO$_3$ heterostructures prepared on several oxide substrates. Room-temperature mobilities of 157, 145, and 143 cm$^2$V$^{-1}$s$^{-1}$ are achieved for heterostructures grown on DyScO$_3$ (110), MgO (001), and TbScO$_3$ (110) crystalline substrates, respectively. This is realized by first employing pulsed laser deposition to grow at very high temperature the SrZrO$_3$ buffer layer to reduce dislocation density in the active layer, then followed by the epitaxial growth of an overlaying La:BaSnO$_3$ active layer by molecular-beam epitaxy. Structural properties of these heterostructures are investigated, and the extracted upper limit of threading dislocations is well below $1.0\times 10^{10}$cm$^{-2}$ for buffered films on DyScO$_3$, MgO, and TbScO$_3$ substrates. The present results provide a promising route towards achieving high mobility in buffered La:BaSnO$_3$ films prepared on most, if not all, oxide substrates with large compressive or tensile lattice mismatches to the film.
Comment: 9 pages and 5 Figures in the Maintext. 3 pages and 3 Figures in the Supplementary Information
نوع الوثيقة: Working Paper
DOI: 10.1063/5.0148467
URL الوصول: http://arxiv.org/abs/2302.12323
رقم الأكسشن: edsarx.2302.12323
قاعدة البيانات: arXiv