We report on the wafer scale fabrication of single mode low-loss lithium niobate on insulator waveguides utilizing a chemically amplified resist and an optimized dry etching method. The fabricated single mode waveguides are free of residuals and re-deposition, with measured losses for straight waveguides around 2 dB/m (0.02 dB/cm). We present on a method offering advantages for large-scale production due to its cost-effectiveness, faster writing time, and simplified processes. This work holds promise for advancing integrated photonics and optical communication technologies.
