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Feature size below 100 nm realized by UV-LED-based microscope projection photolithography

التفاصيل البيبلوغرافية
العنوان: Feature size below 100 nm realized by UV-LED-based microscope projection photolithography
المؤلفون: Lei Zheng, Tobias Birr, Urs Zywietz, Carsten Reinhardt, Bernhard Roth
المصدر: Light: Advanced Manufacturing, Vol 4, Iss 4, Pp 410-419 (2024)
بيانات النشر: Light Publishing Group, 2024.
سنة النشر: 2024
المجموعة: LCC:Manufactures
LCC:Applied optics. Photonics
مصطلحات موضوعية: microfabrication, nanofabrication, subwavelength structuring, projection lithography, uv-led lithography, Manufactures, TS1-2301, Applied optics. Photonics, TA1501-1820
الوصف: The demand for miniaturization and integration of optical elements has fostered the development of various micro- and nanofabrication technologies. In this work, we developed a low-cost UV-LED-based microscope projection photolithography system for rapid and high-resolution fabrication. This system can be easily implemented using off-the-shelf components. It allows for micro- and nanostructuring within seconds. By optimizing the process, a minimum feature size down to approximately 85 nm was successfully realized. In addition, investigations on fabrication of the same structures using both costly and economic microscope objectives were performed. Feature sizes below 100 nm can be stably achieved. The demonstrated approach extends the technology capabilities and may find applications in fields such as nanophotonics, biophotonics sensing and material science.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 2689-9620
Relation: https://doaj.org/toc/2689-9620
DOI: 10.37188/lam.2023.033
URL الوصول: https://doaj.org/article/12ee9eb8784448b1b18fe59eeec2df8b
رقم الأكسشن: edsdoj.12ee9eb8784448b1b18fe59eeec2df8b
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:26899620
DOI:10.37188/lam.2023.033