دورية أكاديمية

Multi-Repeated Projection Lithography for High-Precision Linear Scale Based on Average Homogenization Effect

التفاصيل البيبلوغرافية
العنوان: Multi-Repeated Projection Lithography for High-Precision Linear Scale Based on Average Homogenization Effect
المؤلفون: Dongxu Ren, Huiying Zhao, Chupeng Zhang, Daocheng Yuan, Jianpu Xi, Xueliang Zhu, Xinxing Ban, Longchao Dong, Yawen Gu, Chunye Jiang
المصدر: Sensors, Vol 16, Iss 4, p 538 (2016)
بيانات النشر: MDPI AG, 2016.
سنة النشر: 2016
المجموعة: LCC:Chemical technology
مصطلحات موضوعية: projection lithography, linear scale, linear displacement sensor, multi-repeated method, average homogenization effect, Chemical technology, TP1-1185
الوصف: A multi-repeated photolithography method for manufacturing an incremental linear scale using projection lithography is presented. The method is based on the average homogenization effect that periodically superposes the light intensity of different locations of pitches in the mask to make a consistent energy distribution at a specific wavelength, from which the accuracy of a linear scale can be improved precisely using the average pitch with different step distances. The method’s theoretical error is within 0.01 µm for a periodic mask with a 2-µm sine-wave error. The intensity error models in the focal plane include the rectangular grating error on the mask, static positioning error, and lithography lens focal plane alignment error, which affect pitch uniformity less than in the common linear scale projection lithography splicing process. It was analyzed and confirmed that increasing the repeat exposure number of a single stripe could improve accuracy, as could adjusting the exposure spacing to achieve a set proportion of black and white stripes. According to the experimental results, the effectiveness of the multi-repeated photolithography method is confirmed to easily realize a pitch accuracy of 43 nm in any 10 locations of 1 m, and the whole length accuracy of the linear scale is less than 1 µm/m.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 1424-8220
16040538
Relation: http://www.mdpi.com/1424-8220/16/4/538; https://doaj.org/toc/1424-8220
DOI: 10.3390/s16040538
URL الوصول: https://doaj.org/article/20c44c39c5bb4fd4b363d07d57eccc50
رقم الأكسشن: edsdoj.20c44c39c5bb4fd4b363d07d57eccc50
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:14248220
16040538
DOI:10.3390/s16040538