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Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits

التفاصيل البيبلوغرافية
العنوان: Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits
المؤلفون: Xingshi Yu, Xia Chen, Milan M. Milosevic, Xingzhao Yan, Shinichi Saito, Graham T. Reed
المصدر: IEEE Photonics Journal, Vol 12, Iss 5, Pp 1-8 (2020)
بيانات النشر: IEEE, 2020.
سنة النشر: 2020
المجموعة: LCC:Applied optics. Photonics
LCC:Optics. Light
مصطلحات موضوعية: Ion-implantation, Electrically erasable, Directional couplers, Mach-Zehnder Interferometer, Wafer scale testing, Applied optics. Photonics, TA1501-1820, Optics. Light, QC350-467
الوصف: A technique for realizing electrically erasable photonics devices using micro-heaters for localized annealing of lattice defects in silicon is presented. The lattice defects have previously been introduced by ion implantation in order to cause a refractive index change. This technique can be used to fabricate electrically erasable on-chip directional couplers (DCs) and Mach-Zehnder Interferometer (MZI) switches. These devices can be used for wafer scale testing of photonics circuits, allowing testing of individual optical components in a complex photonic integrated circuit, or components for programmable optical circuits, whilst inducing negligible additional optical loss when erased electrically. In this paper, we report the designs and experimental results of fully, rapidly annealing of these devices.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 1943-0655
Relation: https://ieeexplore.ieee.org/document/9210769/; https://doaj.org/toc/1943-0655
DOI: 10.1109/JPHOT.2020.3027799
URL الوصول: https://doaj.org/article/ce50a892d09e487fa5e14d37937c5494
رقم الأكسشن: edsdoj.50a892d09e487fa5e14d37937c5494
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:19430655
DOI:10.1109/JPHOT.2020.3027799