Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO3), Molybdenum Oxide (MoO3) and Tin Oxide (SnO2) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications

التفاصيل البيبلوغرافية
العنوان:	Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO3), Molybdenum Oxide (MoO3) and Tin Oxide (SnO2) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
المؤلفون:	Engin Ciftyurek, Martin Wilken, David Zanders, Lukas Mai, Anjana Devi, Klaus D. Schierbaum
المصدر:	Proceedings, Vol 14, Iss 1, p 27 (2019)
بيانات النشر:	MDPI AG, 2019.
سنة النشر:	2019
المجموعة:	LCC:General Works
مصطلحات موضوعية:	n/a, General Works
الوصف:	Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method inwhich high-quality [...]
نوع الوثيقة:	article
وصف الملف:	electronic resource
اللغة:	English
تدمد:	2504-3900
Relation:	https://www.mdpi.com/2504-3900/14/1/27; https://doaj.org/toc/2504-3900
DOI:	10.3390/proceedings2019014027
URL الوصول:	https://doaj.org/article/82e2b40d2694447cb8b09aa315b1bbac
رقم الأكسشن:	edsdoj.82e2b40d2694447cb8b09aa315b1bbac
قاعدة البيانات:	Directory of Open Access Journals

الوصف
تدمد:	25043900
DOI:	10.3390/proceedings2019014027