دورية أكاديمية
Stationary beam full-field transmission helium ion microscopy using sub-50 keV He+: Projected images and intensity patterns
العنوان: | Stationary beam full-field transmission helium ion microscopy using sub-50 keV He+: Projected images and intensity patterns |
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المؤلفون: | Michael Mousley, Santhana Eswara, Olivier De Castro, Olivier Bouton, Nico Klingner, Christoph T. Koch, Gregor Hlawacek, Tom Wirtz |
المصدر: | Beilstein Journal of Nanotechnology, Vol 10, Iss 1, Pp 1648-1657 (2019) |
بيانات النشر: | Beilstein-Institut, 2019. |
سنة النشر: | 2019 |
المجموعة: | LCC:Technology LCC:Chemical technology LCC:Science LCC:Physics |
مصطلحات موضوعية: | charging, helium ion microscopy, ion diffraction, ion scattering, transmission ion microscopy, Technology, Chemical technology, TP1-1185, Science, Physics, QC1-999 |
الوصف: | A dedicated transmission helium ion microscope (THIM) for sub-50 keV helium has been constructed to investigate ion scattering processes and contrast mechanisms, aiding the development of new imaging and analysis modalities. Unlike a commercial helium ion microscope (HIM), the in-house built instrument allows full flexibility in experimental configuration. Here, we report projection imaging and intensity patterns obtained from powder and bulk crystalline samples using stationary broad-beam as well as convergent-beam illumination conditions in THIM. The He+ ions formed unexpected spot patterns in the far field for MgO, BN and NaCl powder samples, but not for Au-coated MgO. The origin of the spot patterns in these samples was investigated. Surface diffraction of ions was excluded as a possible cause because the recorded scattering angles do not correspond to the predicted Bragg angles. Complementary secondary electron (SE) imaging in the HIM revealed that these samples charge significantly under He+ ion irradiation. The spot patterns obtained in the THIM experiments are explained as artefacts related to sample charging. The results presented here indicate that factors other than channeling, blocking and surface diffraction of ions have an impact on the final intensity distribution in the far field. Hence, the different processes contributing to the final intensities will need to be understood in order to decouple and study the relevant ion-beam scattering and deflection phenomena. |
نوع الوثيقة: | article |
وصف الملف: | electronic resource |
اللغة: | English |
تدمد: | 2190-4286 |
Relation: | https://doaj.org/toc/2190-4286 |
DOI: | 10.3762/bjnano.10.160 |
URL الوصول: | https://doaj.org/article/9bf3d0611bd0418d93fc4866c7dac24f |
رقم الأكسشن: | edsdoj.9bf3d0611bd0418d93fc4866c7dac24f |
قاعدة البيانات: | Directory of Open Access Journals |
تدمد: | 21904286 |
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DOI: | 10.3762/bjnano.10.160 |