دورية أكاديمية
Effects of elevated-temperature deposition on the atomic structure of amorphous Ta2O5 films
| العنوان: | Effects of elevated-temperature deposition on the atomic structure of amorphous Ta2O5 films |
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| المؤلفون: | K. Prasai, K. Lee, B. Baloukas, H-P. Cheng, M. Fazio, L. Martinu, A. Mehta, C. S. Menoni, F. Schiettekatte, R. Shink, B. Shyam, G. Vajente, M. M. Fejer, R. Bassiri |
| المصدر: | APL Materials, Vol 11, Iss 12, Pp 121112-121112-8 (2023) |
| بيانات النشر: | AIP Publishing LLC, 2023. |
| سنة النشر: | 2023 |
| المجموعة: | LCC:Biotechnology LCC:Physics |
| مصطلحات موضوعية: | Biotechnology, TP248.13-248.65, Physics, QC1-999 |
| الوصف: | Brownian thermal noise as a result of mechanical loss in optical coatings will become the dominant source of noise at the most sensitive frequencies of ground-based gravitational-wave detectors. Experiments found, however, that a candidate material, amorphous Ta2O5, is unable to form an ultrastable glass and, consequently, to yield a film with significantly reduced mechanical loss through elevated-temperature deposition alone. X-ray scattering PDF measurements are carried out on films deposited and subsequently annealed at various temperatures. Inverse atomic modeling is used to analyze the short and medium range features in the atomic structure of these films. Furthermore, in silico deposition simulations of Ta2O5 are carried out at various substrate temperatures and an atomic level analysis of the growth at high temperatures is presented. It is observed that upon elevated-temperature deposition, short range features remain identical, whereas medium range order increases. After annealing, however, both the short and medium range orders of films deposited at different substrate temperatures are nearly identical. A discussion on the surface diffusion and glass transition temperatures indicates that future pursuits of ultrastable low-mechanical-loss films through elevated temperature deposition should focus on materials with a high surface mobility, and/or lower glass transition temperatures in the range of achievable deposition temperatueres. |
| نوع الوثيقة: | article |
| وصف الملف: | electronic resource |
| اللغة: | English |
| تدمد: | 2166-532X |
| Relation: | https://doaj.org/toc/2166-532X |
| DOI: | 10.1063/5.0170100 |
| URL الوصول: | https://doaj.org/article/b250e6baee5449da81c51b0d80421d56 |
| رقم الأكسشن: | edsdoj.b250e6baee5449da81c51b0d80421d56 |
| قاعدة البيانات: | Directory of Open Access Journals |
Find this article in full text from Scitation. 
Full Text Finder | تدمد: | 2166532X |
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| DOI: | 10.1063/5.0170100 |