دورية أكاديمية

Tunneling Transistors Based on MoS2/MoTe2 Van der Waals Heterostructures

التفاصيل البيبلوغرافية
العنوان: Tunneling Transistors Based on MoS2/MoTe2 Van der Waals Heterostructures
المؤلفون: Yashwanth Balaji, Quentin Smets, Cesar Javier Lockhart De La Rosa, Anh Khoa Augustin Lu, Daniele Chiappe, Tarun Agarwal, Dennis H. C. Lin, Cedric Huyghebaert, Iuliana Radu, Dan Mocuta, Guido Groeseneken
المصدر: IEEE Journal of the Electron Devices Society, Vol 6, Pp 1048-1055 (2018)
بيانات النشر: IEEE, 2018.
سنة النشر: 2018
المجموعة: LCC:Electrical engineering. Electronics. Nuclear engineering
مصطلحات موضوعية: 2D materials, TMD, TFET, band-to-band tunneling, heterostructures, Schottky contacts, Electrical engineering. Electronics. Nuclear engineering, TK1-9971
الوصف: 2-D transition metal dichalcogenides (TMDs) are promising materials for CMOS application due to their ultrathin channel with excellent electrostatic control. TMDs are especially well suited for tunneling field-effect transistors (TFETs) due to their low-dielectric constant and their promise of atomically sharp and self-passivated interfaces. Here, we experimentally demonstrate band-to-band tunneling (BTBT) in Van der Waals heterostructures formed by MoS2 and MoTe2. Density functional theory simulations of the band structure show our MoS2-MoTe2 heterojunctions have a staggered band alignment, which boosts BTBT compared to a homojunction configuration. Low-temperature measurements and electrostatic simulations provide understanding toward the role of Schottky contacts and the material thickness on device performance. Negative differential transconductance-based devices were also demonstrated using a different device architecture. This paper provides the prerequisites and challenges required to overcome at the contact region to achieve a steep subthreshold slope and high ON-currents with 2-D-based TFETs.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 2168-6734
Relation: https://ieeexplore.ieee.org/document/8315402/; https://doaj.org/toc/2168-6734
DOI: 10.1109/JEDS.2018.2815781
URL الوصول: https://doaj.org/article/b3e6abfea7bb4f1db4bad4d5dfcd0818
رقم الأكسشن: edsdoj.b3e6abfea7bb4f1db4bad4d5dfcd0818
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:21686734
DOI:10.1109/JEDS.2018.2815781