دورية أكاديمية

Impact of GaAs(100) surface preparation on EQE of AZO/Al2O3/p-GaAs photovoltaic structures

التفاصيل البيبلوغرافية
العنوان: Impact of GaAs(100) surface preparation on EQE of AZO/Al2O3/p-GaAs photovoltaic structures
المؤلفون: Piotr Caban, Rafał Pietruszka, Jarosław Kaszewski, Monika Ożga, Bartłomiej S. Witkowski, Krzysztof Kopalko, Piotr Kuźmiuk, Katarzyna Gwóźdź, Ewa Płaczek-Popko, Krystyna Lawniczak-Jablonska, Marek Godlewski
المصدر: Beilstein Journal of Nanotechnology, Vol 12, Iss 1, Pp 578-592 (2021)
بيانات النشر: Beilstein-Institut, 2021.
سنة النشر: 2021
المجموعة: LCC:Technology
LCC:Chemical technology
LCC:Science
LCC:Physics
مصطلحات موضوعية: atomic layer deposition, external quantum efficiency, gallium arsenide, photovoltaics, surface passivation, Technology, Chemical technology, TP1-1185, Science, Physics, QC1-999
الوصف: In order to effectively utilize the photovoltaic properties of gallium arsenide, its surface/interface needs to be properly prepared. In the experiments described here we examined eight different paths of GaAs surface treatment (cleaning, etching, passivation) which resulted in different external quantum efficiency (EQE) values of the tested photovoltaic (PV) cells. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) examinations were conducted to obtain structural details of the devices. X-ray photoelectron spectroscopy (XPS) with depth profiling was used to examine interface structure and changes in the elemental content and chemical bonds. The photoluminescence (PL) properties and bandgap measurements of the deposited layers were also reported. The highest EQE value was obtained for the samples initially etched with a citric acid-based etchant and, in the last preparation step, either passivated with ammonium sulfide aqueous solution or treated with ammonium hydroxide solution with no final passivation. Subsequent I–V measurements, however, confirmed that from these samples, only the sulfur-passivated ones provided the highest current density. The tested devices were fabricated by using the ALD method.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 2190-4286
Relation: https://doaj.org/toc/2190-4286
DOI: 10.3762/bjnano.12.48
URL الوصول: https://doaj.org/article/bf2dc07e7e89420c8fdc2ab159b677bc
رقم الأكسشن: edsdoj.bf2dc07e7e89420c8fdc2ab159b677bc
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:21904286
DOI:10.3762/bjnano.12.48