دورية أكاديمية

Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on

التفاصيل البيبلوغرافية
العنوان: Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on
المؤلفون: M. H. Lee, Y.-T. Wei, J.-C. Lin, C.-W. Chen, W.-H. Tu, M. Tang
المصدر: AIP Advances, Vol 4, Iss 10, Pp 107117-107117-6 (2014)
بيانات النشر: AIP Publishing LLC, 2014.
سنة النشر: 2014
المجموعة: LCC:Physics
مصطلحات موضوعية: Physics, QC1-999
الوصف: Using a ferroelectric PbZrTiO3 gate stack, the range of the steep subthreshold swing in tunnel field-effect transistors was extended by 3.5 orders of magnitude demonstrating an improvement in the swing (by approximately double the slope). The drain conductance (gd) shows only 16% enhancement with large V DS (∼−1.5V) indicates internal voltage amplification with ferroelectric negative capacitance effect beneficial to small lateral drain-source bias voltages (−0.1 V). The concept of coupling the ferroelectric polarization is proposed. The power consumption is also discussed in low-power applications of steep subthreshold slope devices.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 2158-3226
Relation: https://doaj.org/toc/2158-3226
DOI: 10.1063/1.4898150
URL الوصول: https://doaj.org/article/f372433118324acc889ec8de2c35c8ee
رقم الأكسشن: edsdoj.f372433118324acc889ec8de2c35c8ee
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:21583226
DOI:10.1063/1.4898150