مؤتمر
A robust shallow trench isolation (STI) with SiN pull-back process for advanced DRAM technology
| العنوان: | A robust shallow trench isolation (STI) with SiN pull-back process for advanced DRAM technology |
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| المؤلفون: | Li, C.H., Tu, K.C., Chu, H.C., Chang, I.H., Liaw, W.R., Lee, H.F., Lien, W.Y., Tsai, M.H., Liang, W.J., Yeh, W.G., Chou, H.M., Chen, C.Y., Chi, M.H. |
| المصدر: | 13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259) Advanced semiconductor manufacturing Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop. :21-26 2002 |
| Relation: | 13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780371585 9780780371583 |
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| DOI: | 10.1109/ASMC.2002.1001567 |