Top surface imaging lithography processes for I-line resists using liquid-phase silylation

التفاصيل البيبلوغرافية
العنوان: Top surface imaging lithography processes for I-line resists using liquid-phase silylation
المؤلفون: Arshak, K., Mihov, M., Arshak, A., McDonagh, D.
المصدر: 2002 23rd International Conference on Microelectronics. Proceedings (Cat. No.02TH8595) Microelectronics Microelectronics, 2002. MIEL 2002. 23rd International Conference on. 2:503-508 vol.2 2002
Relation: Proceedings of 23rd International Conference on Microelectronics (MIEL 2002)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780372352
9780780372351
DOI:10.1109/MIEL.2002.1003307