Stress Migration of Aluminum Backside Interconnect in Xtacking®

التفاصيل البيبلوغرافية
العنوان: Stress Migration of Aluminum Backside Interconnect in Xtacking®
المؤلفون: Yang, Kang, Yang, Suhui, Ouyang, Yan, Yang, Shengwei, Han, Kun, He, Yi
المصدر: 2023 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2023 IEEE International. :1-4 Mar, 2023
Relation: 2023 IEEE International Reliability Physics Symposium (IRPS)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665456722
تدمد:19381891
DOI:10.1109/IRPS48203.2023.10117817