Eliminating Polymer Flaking on a Passivation Etch Chamber using Carbon Polymer Coating Method

التفاصيل البيبلوغرافية
العنوان: Eliminating Polymer Flaking on a Passivation Etch Chamber using Carbon Polymer Coating Method
المؤلفون: Igana, Noel Portes, Gozali, Rendy Wiyogo, Shiang, Loh Kim, Haiqing, Zhang
المصدر: 2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2023 34th Annual. :1-4 May, 2023
Relation: 2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
قاعدة البيانات: IEEE Xplore Digital Library