دورية أكاديمية

Optimization of RF Frequencies in Dual-Frequency Capacitively Coupled Plasma Apparatus Using Genetic Algorithm (GA) and Plasma Simulation

التفاصيل البيبلوغرافية
العنوان: Optimization of RF Frequencies in Dual-Frequency Capacitively Coupled Plasma Apparatus Using Genetic Algorithm (GA) and Plasma Simulation
المؤلفون: Takagi, S., Sekine, M., Nakaegawa, T., Hsiao, S.
المصدر: IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 36(4):547-552 Nov, 2023
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:08946507
15582345
DOI:10.1109/TSM.2023.3282566