Impact of Gate Morphology on Electrical Performances of Recessed GaN-on Si MOS channel-HEMT for Different Channel Orientations

التفاصيل البيبلوغرافية
العنوان: Impact of Gate Morphology on Electrical Performances of Recessed GaN-on Si MOS channel-HEMT for Different Channel Orientations
المؤلفون: Piotrowic, C., Mohamad, B., Rocha, P. Fernandes Paes Pinto, Malbert, N., Ruel, S., Pimenta-Barros, P., Jaud, M.-A., Vauche, L., Royer, C. Le
المصدر: 2023 35th International Symposium on Power Semiconductor Devices and ICs (ISPSD) Power Semiconductor Devices and ICs (ISPSD), 2023 35th International Symposium on. :382-385 May, 2023
Relation: 2023 35th International Symposium on Power Semiconductor Devices and ICs (ISPSD)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350396829
تدمد:19460201
DOI:10.1109/ISPSD57135.2023.10147642