دورية أكاديمية
Corrections to “Low-Temperature Microwave Annealing Processes for Future IC Fabrication—A Review” [Mar 14 651-665]
العنوان: | Corrections to “Low-Temperature Microwave Annealing Processes for Future IC Fabrication—A Review” [Mar 14 651-665] |
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المؤلفون: | Lee, Y., Cho, T., Chuang, S., Hsueh, F., Lu, Y., Sung, P., Chen, H., Current, M.I., Tseng, T., Chao, T., Hu, C., Yang, F. |
المصدر: | IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 70(7):3983-3983 Jul, 2023 |
قاعدة البيانات: | IEEE Xplore Digital Library |
تدمد: | 00189383 15579646 |
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DOI: | 10.1109/TED.2023.3272843 |