Silicon surface roughness improvement during plasma etch

التفاصيل البيبلوغرافية
العنوان: Silicon surface roughness improvement during plasma etch
المؤلفون: Yang, Guang, Zeng, Li, Zhu, Haiyun, Wang, Jing, Jiang, Zhongwei
المصدر: 2023 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2023 China. :1-2 Jun, 2023
Relation: 2023 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350311006
9798350310993
DOI:10.1109/CSTIC58779.2023.10219230