The Investigation of CF3I For High-Aspect-Ratio Cryogenic Dielectric Etch

التفاصيل البيبلوغرافية
العنوان: The Investigation of CF3I For High-Aspect-Ratio Cryogenic Dielectric Etch
المؤلفون: Hou, Jianqiu, Xu, Vina, Zhang, Kai, Wu, Ziyang
المصدر: 2023 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2023 China. :1-4 Jun, 2023
Relation: 2023 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350311006
9798350310993
DOI:10.1109/CSTIC58779.2023.10219239