Technical Difficulties and Optimization Methods of Nmos Share CT IN Contact Hole Etching

التفاصيل البيبلوغرافية
العنوان: Technical Difficulties and Optimization Methods of Nmos Share CT IN Contact Hole Etching
المؤلفون: Zhu, Peng, Xu, Renhui, Fu, Wentao, Sun, Lei, Bao, Yu
المصدر: 2023 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2023 China. :1-3 Jun, 2023
Relation: 2023 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350311006
9798350310993
DOI:10.1109/CSTIC58779.2023.10219259