مؤتمر
The Plasma Etching of the Deep Hole Structure in Silicon with the Mixed Gas of SF6, HBr and O2
| العنوان: | The Plasma Etching of the Deep Hole Structure in Silicon with the Mixed Gas of SF6, HBr and O2 |
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| المؤلفون: | Wang, Qifei, Ma, Yiming, Jiang, Zhongwei, Wang, Jing, Zhu, Haiyun |
| المصدر: | 2023 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2023 China. :1-3 Jun, 2023 |
| Relation: | 2023 China Semiconductor Technology International Conference (CSTIC) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
| ردمك: | 9798350311006 9798350310993 |
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| DOI: | 10.1109/CSTIC58779.2023.10219267 |