مؤتمر
Influence of Interfacial Layers and High-k Post Dielectric Annealing On the Characteristics of MOS Devices
| العنوان: | Influence of Interfacial Layers and High-k Post Dielectric Annealing On the Characteristics of MOS Devices |
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| المؤلفون: | Sang, Guanqiao, Zhang, Qingzhu, Yin, Huaxiang, Li, Junfeng, Qin, Xulei |
| المصدر: | 2023 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2023 China. :1-3 Jun, 2023 |
| Relation: | 2023 China Semiconductor Technology International Conference (CSTIC) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
| ردمك: | 9798350311006 9798350310993 |
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| DOI: | 10.1109/CSTIC58779.2023.10219268 |