Study on the Effect of Water Spraying Mode on the N Content of Wafer Surface after SC1 Cleaning in Light Doping Process

التفاصيل البيبلوغرافية
العنوان: Study on the Effect of Water Spraying Mode on the N Content of Wafer Surface after SC1 Cleaning in Light Doping Process
المؤلفون: Wang, Jinlei, Guan, Fenglin, Hang, Mingguang, Jia, Lili, Li, Fang, Cheng, Xinhua
المصدر: 2023 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2023 China. :1-3 Jun, 2023
Relation: 2023 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350311006
9798350310993
DOI:10.1109/CSTIC58779.2023.10219384