A Multi-Step Sraf to Improve Process Windows in Metal Layer

التفاصيل البيبلوغرافية
العنوان: A Multi-Step Sraf to Improve Process Windows in Metal Layer
المؤلفون: Wei, Wei, Zhu, Lu, Wang, Dan, Sun, Xiaoyan, Wang, Yue, Zhang, Yueyu, Liu, Jianzhong, Yu, Shiri
المصدر: 2023 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2023 China. :1-4 Jun, 2023
Relation: 2023 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350311006
9798350310993
DOI:10.1109/CSTIC58779.2023.10219385