The development of the process for low-temperature surface carbonization of Si(111) substrate and the subsequent growth of 3C-SiC epitaxial buffer layer

التفاصيل البيبلوغرافية
العنوان: The development of the process for low-temperature surface carbonization of Si(111) substrate and the subsequent growth of 3C-SiC epitaxial buffer layer
المؤلفون: Tsai, Pei-Chun, Huang, Jhong-Ren, Hong, Lu-Sheng
المصدر: 2023 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia), 2023 IEEE Workshop on. :1-4 Aug, 2023
Relation: 2023 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)
قاعدة البيانات: IEEE Xplore Digital Library