التفاصيل البيبلوغرافية
| العنوان: |
A Morphology Control Method of Submicron SiO2 Arrays in CHF3/Ar Inductively Coupled Plasma Etching |
| المؤلفون: |
Zhang, Zhibo, Dong, Litong, Wang, Lu, Ouyang, Mingzhao, Liu, Mengnan, Wang, Zuobin |
| المصدر: |
2023 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2023 IEEE International Conference on. :272-275 Jul, 2023 |
| Relation: |
2023 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
Full Text Finder