دورية أكاديمية
Performance Optimization for Ferroelectric HfZrOx on a Ge Substrate by Modifying the Deposition Temperature
العنوان: | Performance Optimization for Ferroelectric HfZrOx on a Ge Substrate by Modifying the Deposition Temperature |
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المؤلفون: | Lyu, S., Jiang, P., Gao, Z., Yang, Y., Chen, Y., Wang, B., Chen, M., Wang, Y. |
المصدر: | IEEE Transactions on Nanotechnology IEEE Trans. Nanotechnology Nanotechnology, IEEE Transactions on. 23:139-143 2024 |
قاعدة البيانات: | IEEE Xplore Digital Library |
تدمد: | 1536125X 19410085 |
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DOI: | 10.1109/TNANO.2023.3338616 |