دورية أكاديمية
How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning
العنوان: | How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning |
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المؤلفون: | Neisser, M., Orji, N.G., Levinson, H.J., Celano, U., Moyne, J., Mashiro, S., Wilcox, D., Libman, S. |
المصدر: | Computer. 57(1):51-58 Jan, 2024 |
قاعدة البيانات: | IEEE Xplore Digital Library |
تدمد: | 00189162 15580814 |
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DOI: | 10.1109/MC.2023.3312767 |