Investigation of the Trap States in Fully-Recessed Normally off LPCVD-Si3N4/PEALD-AlN/GaN MIS-HEMT with in-Situ N2 or H2/N2 Plasma Pretreatment

التفاصيل البيبلوغرافية
العنوان: Investigation of the Trap States in Fully-Recessed Normally off LPCVD-Si3N4/PEALD-AlN/GaN MIS-HEMT with in-Situ N2 or H2/N2 Plasma Pretreatment
المؤلفون: Yang, Jiaofen, Tao, Ming, Xiao, Jing, Zhang, Bin, Wang, Hongyue, He, Min, Liu, Jie, Wang, Jinyan, Wang, Maojun
المصدر: 2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS) Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS), 2023 20th China International Forum on. :204-207 Nov, 2023
Relation: 2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350385373
DOI:10.1109/SSLChinaIFWS60785.2023.10399730