Exploring manufacturability of novel 2D channel materials: 300 mm wafer-scale 2D NMOS & PMOS using MoS2, WS2, & WSe2

التفاصيل البيبلوغرافية
العنوان:	Exploring manufacturability of novel 2D channel materials: 300 mm wafer-scale 2D NMOS & PMOS using MoS2, WS2, & WSe2
المؤلفون:	Dorow, C. J., Schram, T., Smets, Q., O'Brien, K. P., Maxey, K., Lin, C.-C., Panarella, L., Kaczer, B., Arefin, N., Roy, A., Jordan, R., Oni, A., Penumatcha, A., Naylor, C. H., Kavrik, M., Cott, D., Graven, B., Afanasiev, V., Morin, P., Asselberghs, I., Lockhart de La Rosa, C. J., Sankar Kar, G., Metz, M., Avci, U.
المصدر:	2023 International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2023 International. :1-4 Dec, 2023
Relation:	2023 International Electron Devices Meeting (IEDM)
قاعدة البيانات:	IEEE Xplore Digital Library