التفاصيل البيبلوغرافية
| العنوان: |
High quality PVD-MoS2 film on plasma-ALD-SiO2 underlaying material for CFET integration |
| المؤلفون: |
Matsunaga, Naoki, Imai, Shinya, Shirokura, Takanori, Tsutsui, Kazuo, Kakushima, Kuniyuki, Wakabayashi, Hitoshi |
| المصدر: |
2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) Electron Devices Technology & Manufacturing Conference (EDTM), 2024 8th IEEE. :1-3 Mar, 2024 |
| Relation: |
2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
