Characterization of Interface Trap Density in SiC MOSFETs Subjected to High Voltage Gate Stress

التفاصيل البيبلوغرافية
العنوان: Characterization of Interface Trap Density in SiC MOSFETs Subjected to High Voltage Gate Stress
المؤلفون: Stein, S. R., Kim, J., Das, S., Lichtenwalner, D. J., Ryu, S.
المصدر: 2024 IEEE International Reliability Physics Symposium (IRPS) International Reliability Physics Symposium (IRPS), 2024 IEEE. :1-5 Apr, 2024
Relation: 2024 IEEE International Reliability Physics Symposium (IRPS)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350369762
تدمد:19381891
DOI:10.1109/IRPS48228.2024.10529394