Multi-Physics Simulation of Electromigration in Cu Interconnect

التفاصيل البيبلوغرافية
العنوان: Multi-Physics Simulation of Electromigration in Cu Interconnect
المؤلفون: Zhang, Xuefeng, Deng, Bin, Zhang, Qingshan, Zhang, Qintong, Bian, Guodong
المصدر: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) Science and Technology for Integrated Circuits (CSTIC), 2024 Conference of. :1-4 Mar, 2024
Relation: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350362190
DOI:10.1109/CSTIC61820.2024.10531896