دورية أكاديمية

Structural and Electrical Characteristics of GaN HEMTs With In Situ SiNx Gate Dielectrics Grown by Rationally Modulated N2/H2 Carrier Gas

التفاصيل البيبلوغرافية
العنوان: Structural and Electrical Characteristics of GaN HEMTs With In Situ SiNx Gate Dielectrics Grown by Rationally Modulated N2/H2 Carrier Gas
المؤلفون: Huang, Z., Zhang, H., Chen, Y., Liang, F., Yang, L., Liang, K., Xing, Z., Wang, H., Zhang, M., Li, J., Ye, Y., Guo, S., Sun, H.
المصدر: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 71(8):4590-4595 Aug, 2024
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:00189383
15579646
DOI:10.1109/TED.2024.3420260