Transistors with dual work function metal gates by single full silicidation (FUSI) of polysilicon gates

التفاصيل البيبلوغرافية
العنوان: Transistors with dual work function metal gates by single full silicidation (FUSI) of polysilicon gates
المؤلفون: Maszara, W.P., Krivokapic, Z., King, P., Goo, J.-S., Lin, M.-R.
المصدر: Digest. International Electron Devices Meeting, Electron devices meeting Electron Devices Meeting, 2002. IEDM '02. International. :367-370 2002
Relation: IEEE International Electron Devices Meeting
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780374622
9780780374621
DOI:10.1109/IEDM.2002.1175854