A highly manufacturable high density embedded SRAM technology for 90 nm CMOS

التفاصيل البيبلوغرافية
العنوان: A highly manufacturable high density embedded SRAM technology for 90 nm CMOS
المؤلفون: Fukaura, Y., Kasai, K., Okayama, Y., Kawasaki, I., Isobe, K., Kanda, M., Ishimaru, K., Ishiuchi, H.
المصدر: Digest. International Electron Devices Meeting, Electron devices meeting Electron Devices Meeting, 2002. IEDM '02. International. :415-418 2002
Relation: IEEE International Electron Devices Meeting
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780374622
9780780374621
DOI:10.1109/IEDM.2002.1175867