The effect of base dopant out-diffusion and undoped SiGe or Si spacer layers at both sides of the base on the characteristics of microwave Si/SiGe/Si HBT's

التفاصيل البيبلوغرافية
العنوان: The effect of base dopant out-diffusion and undoped SiGe or Si spacer layers at both sides of the base on the characteristics of microwave Si/SiGe/Si HBT's
المؤلفون: Zhang Wan-rong, Liu Hai-jiang, Wang Li-xin, Wang Dong, Li Zhi-guo, Chen Yao-hai, Chen Jianxin, Shen Guang-di
المصدر: 2002 3rd International Conference on Microwave and Millimeter Wave Technology, 2002. Proceedings. ICMMT 2002. Microwave and millimeter wave technology Microwave and Millimeter Wave Technology, 2002. Proceedings. ICMMT 2002. 2002 3rd International Conference on. :66-69 2002
Relation: Proceedings of 3rd International Conference on Microwave and Millimeter Wave Technology
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:078037486X
9780780374867
DOI:10.1109/ICMMT.2002.1187636