مؤتمر
TiN/HfO/sub 2//TiN capacitor technology applicable to 70 nm generation DRAMs
| العنوان: | TiN/HfO/sub 2//TiN capacitor technology applicable to 70 nm generation DRAMs |
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| المؤلفون: | Se-Hoon Oh, Jeong-Hee Chung, Jae-Hyoung Choi, Cha-Young Yoo, Young Sun Kim, Sung Tae Kim, U-In Chung, Joo Tae Moon |
| المصدر: | 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407) VLSI technology VLSI Technology, 2003. Digest of Technical Papers. 2003 Symposium on. :73-74 2003 |
| Relation: | 2003 Symposium on VLSI Technology. Digest of Technical Papers |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 489114033X 9784891140335 |
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| DOI: | 10.1109/VLSIT.2003.1221092 |