Electrical stability of the organic-inorganic material with low-k dielectric constant deposited by ICPCVD method

التفاصيل البيبلوغرافية
العنوان: Electrical stability of the organic-inorganic material with low-k dielectric constant deposited by ICPCVD method
المؤلفون: Oh, K.S., Choi, C.K.
المصدر: The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. Plasma science Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on. :409 2003
Relation: 30th International Conference on Plasma Science
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:078037911X
9780780379114
تدمد:07309244
DOI:10.1109/PLASMA.2003.1229959