دورية أكاديمية

Self-aligned nickel, cobalt/tantalum nitride stacked-gate pMOSFETs fabricated with a low temperature process after metal electrode deposition

التفاصيل البيبلوغرافية
العنوان: Self-aligned nickel, cobalt/tantalum nitride stacked-gate pMOSFETs fabricated with a low temperature process after metal electrode deposition
المؤلفون: Pan, J., Woo, C., Ngo, M.-V., Chih-Yuh Yang, Besser, P., King, P., Bernard, J., Adem, E., Tracy, B., Pellerin, J., Qi Xiang, Ming-Ren Lin
المصدر: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 50(12):2456-2460 Dec, 2003
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:00189383
15579646
DOI:10.1109/TED.2003.819434