Elemental analysis of residual deposits in an ion implanter using IBA techniques

التفاصيل البيبلوغرافية
العنوان: Elemental analysis of residual deposits in an ion implanter using IBA techniques
المؤلفون: Mefo, J., Kirkby, K.J., Sealy, B.J., Boudreault, G., Jeynes, C., Collart, E.J.H.
المصدر: Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Ion implantation technology proceedings Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on. :467-470 2002
Relation: Proceedings of the 2002 14th International Conference on Ion Implantation Technology
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780371550
9780780371552
DOI:10.1109/IIT.2002.1258042