مؤتمر
Elemental analysis of residual deposits in an ion implanter using IBA techniques
العنوان: | Elemental analysis of residual deposits in an ion implanter using IBA techniques |
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المؤلفون: | Mefo, J., Kirkby, K.J., Sealy, B.J., Boudreault, G., Jeynes, C., Collart, E.J.H. |
المصدر: | Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Ion implantation technology proceedings Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on. :467-470 2002 |
Relation: | Proceedings of the 2002 14th International Conference on Ion Implantation Technology |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 0780371550 9780780371552 |
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DOI: | 10.1109/IIT.2002.1258042 |