Compatibility of dual metal gate electrodes with high-k dielectrics for CMOS

التفاصيل البيبلوغرافية
العنوان: Compatibility of dual metal gate electrodes with high-k dielectrics for CMOS
المؤلفون: JaeHoon Lee, You-Seok Suh, Lazar, H., Jha, R., Gurganus, J., Yanxia Lin, Misra, V.
المصدر: IEEE International Electron Devices Meeting 2003 Electron devices IEDM'03 Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International. :13.5.1-13.5.4 2003
Relation: IEEE International Electron Devices Meeting 2003
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780378725
9780780378728
DOI:10.1109/IEDM.2003.1269290