Highly performant double gate MOSFET realized with SON process

التفاصيل البيبلوغرافية
العنوان: Highly performant double gate MOSFET realized with SON process
المؤلفون: Harrison, S., Coronel, P., Leverd, F., Cerutti, R., Palla, R., Delille, D., Borel, S., Jullian, S., Pantel, R., Descombes, S., Dutartre, D., Morand, Y., Samson, M.P., Lenoble, D., Talbot, A., Villaret, A., Monfray, S., Mazoyer, P., Bustos, J., Brut, H., Cros, A., Munteanu, D., Autran, J.-L., Skotnicki, T.
المصدر: IEEE International Electron Devices Meeting 2003 Electron devices IEDM'03 Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International. :18.6.1-18.6.4 2003
Relation: IEEE International Electron Devices Meeting 2003
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780378725
9780780378728
DOI:10.1109/IEDM.2003.1269319