A novel leakage current separation technique in a direct tunneling regime gate oxide SONOS memory cell

التفاصيل البيبلوغرافية
العنوان: A novel leakage current separation technique in a direct tunneling regime gate oxide SONOS memory cell
المؤلفون: Chung, S.S., Chiang, P.-Y., Chou, G., Huang, C.-T., Chen, P., Chu, C.-H., Hsu, C.C.-H.
المصدر: IEEE International Electron Devices Meeting 2003 Electron devices IEDM'03 Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International. :26.6.1-26.6.4 2003
Relation: IEEE International Electron Devices Meeting 2003
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780378725
9780780378728
DOI:10.1109/IEDM.2003.1269357